Conferences & Events

Forthcoming Institute Conferences

Date:02 April 2007 to 05 April 2007
Venue:Churchill College, Cambridge
Organised by:The EMAG Group of the Institute of Physics
Sponsored by:Co-sponsored by The Royal Microscopical Society and endorsed by the Materials Research Society

Introduction


Registration

Programme

Exhibition

The conference will focus on the most recent advances in the study of the structural and electronic properties of semiconducting materials by the application of transmission and scanning electron microscopy. The latest developments in the use of other important microcharacterisation techniques including scanning probe microscopy and X-ray topography and diffraction will also be featured. Developments in materials science and technology covering the complete range of elemental and compound semiconductors will be described.

The main topic areas to be covered are as follows:

  • The characterisation of as-grown semiconductors in both bulk and thin film forms.
  • The study of nanostructures of all types from quantum dots, wires, etc to nanotubes.
  • The investigation of lattice defect and impurity behaviour in semiconducting materials.
  • The study of the effects of semiconductor processing treatments
    - oxidation, nitridation, ion implantation, annealing, silicidation, etc.
  • The assessment of finished electronic devices, including studies of the influence of structural defects upon their behaviour and important new design features such as high/low k dielectrics, etc.
  • The state of the art in analytical technique development from advances in FEGTEM nanoanalysis to exploitation of FIB milling for specimen preparation.

Special conference sessions will focus attention on recent advances in a number of areas of particular current interest, for example:

  • Developments in the use of high resolution imaging and analytical transmission electron microscopy
    - studies of bulk material, layers and interfaces.
  • Advances in FIB milling and nanofabrication.
  • The nature of epitaxial layers, superlattices and quantum well, wire and dot structures
    - strain relaxation, defect introduction, morphological distortion, self-organisation, luminescence.
  • Wide bandgap semiconductors, especially III-nitrides.
  • The structures of dislocations and defect boundaries in semiconductors.
  • Advances in SiGe/Si for device structures such as HBTs, MOSFETs, terahertz emitters, etc.
  • Metal-semiconductor contacts and silicides.
  • The effects of processing treatments using both conventional and transient techniques.
  • The exploitation of advanced scanning techniques
    -SEM-EBIC, SEM-CL, etc
    -STM, AFM, SCM, BEEM, etc

PDF of Final call for papers



Invited Speakers
Important topics will be highlighted in keynote presentations given by leading invited speakers, including those listed below:

Advanced nanoscale analysis of semiconducting materials
C Colliex (Universite Paris-Sud, France)

Nano-FIB: from research to application - A European scalpel for nanosciences
J Gierak (LPN Marcoussis, France)

The puzzle of exciton localisation in GaN-based structures: TEM, AFM and 3D APFIM hold the key
C Humphreys (University of Cambridge, UK)

Carbon nanotubes from science to technology
S Iijima (Meijo University, Nagoya, Japan)

STM studies of III-V semiconductor nanostructure formation
T Jones (Imperial College, London, UK)

Advanced GaN-related devices and materials interactions
A Khan (South Carolina University, Columbia, USA)

Moore's Law and its effect on microscopy in the semiconductor industry
J Mardinly (INTEL Corp., Santa Clara, USA)

Light emission from silicon nanostructures
F Priolo (INFM-MATIS, Catania University, Italy)

Microscopy of radial crystals and radial superlattices
O G Schmidt (Max Planck Institute, Stuttgart, Germany)

Recent studies of heteroepitaxial systems
D J Smith (Arizona State University, Tempe, USA)

Progress in aberration-corrected transmission electron microscopy of materials
K Tillmann (Ernst-Ruska Center, Julich, Germany)

Low energy electron microscopy of semiconducting materials
R Tromp (IBM Yorktown Heights, New York, USA)


Programme
To view the complete MSMXV programme please select a link below:
MSMXV Oral Programme
MSMXV Poster Programme

Session Programmes

To view individual session programmes please select from the links below:
Oral
Monday 2 April 2007
Session A - Expitaxy I: Wide Band-Gap Nitrides
Session B - Expitaxy II: Layer Characterisation

Tuesday 3 April 2007
Session C - High Resolution Microscopy and Nanoanalysis
Session D - Quantum Domain Structures

Wednesday 4 April 2007
Session E - Quantum Domain Structures Continued
Session F - Processed Si, Silicides and Other Materials I
Session G - Processed Si, Silicides and Other Materials II

Thursday 5 April 2007
Session H - Device Studies
Session I - Scanning Probe Applications
Session J - Advanced Scanning Ion and Electron Developments

Poster
Monday 2 April 2007

Poster Session-P1

Tuesday 3 April 2007
Poster Session-P2

Wednesday 4 April 2007
Poster Session-P3

Thursday 5 April 2007
Poster Session-P4


Registration

Registration for this conference has now closed.

For enquiries please contact Jodie Cartwright via email at  jodie.cartwright@iop.org.

The fees for the conference include refreshments and lunches, conference material, basic costs and administration charges.

* 

Member      

£330

**

Concessionary

£180

*** 

Non-Member

£390

*Members of the Institute of Physics
the Members rate is available to:
All members of the
Institute of Physics including those with applications pending
Staff at Institute Affiliated Plus Schools
Members of co-sponsoring Institutes and Societies
Members of other Physics societies which have a Companion Society or other collaboration agreement with the
Institute of Physics
Members of the BAN (Business Affiliates Network).


**Concessionary Rate - Institute members
The Concessionary rate is available to Institute of Physics student and retired membership holders. (Please submit proof of status of your membership together with your registration form


***Non-Members
Registrants paying this fee will automatically become affiliate members of the
Institute of Physics for 12 months and will receive copies of Physics World. As an affiliate member you will be entitled to attend all conferences at the member’s rate for the year and to join one technical or professional group at no extra charge.

Membership of the Institute of Physics is open to all those with an interest in Physics. For further information, please visit http://www.members.iop.org or e-mail membership@iop.org

Cancellations  
No payment can be refunded to those cancelling after Thursday 2 March 2006. All cancellations must be made in writing (please note that we are unable to accept cancellations made over the telephone).


Conference Handbook

The MSMXV Conference Handbook is available to download for conference delegates. A printed version will be included in the Conference Bags presented to delegates when registering at the conference.


Instructions for Paper Presenters

Presentation instructions for Invited and Contributed oral and poster papers are available. Please refer to the programme for presentation times.


Conference Proceedings

The Proceedings of the conference will be published using camera- ready copy in a manner similar to previous conferences in the MSM series.

Instructions which give manuscript format information for authors of contributed papers can be obtained by clicking here.

Instructions which give manuscript format information for authors of invited papers can be obtained by clicking here.

Please follow the links to obtain Reprint Order, Copyright Transfer and Check List forms.



Location and Venue

The conference will be held at Churchill College which is situated to the west of Cambridge and is easily accessible by road, rail and air. Located directly off junction 14 of the M11 motorway, Churchill benefits from ample on-site free parking and is within 2 miles of Cambridge railway station which operates frequent services from London Kings Cross and Liverpool Street, with a direct link from Stansted Airport.

 


Exhibition

An exhibition on related products and techniques will be held alongside the conference to provide an opportunity to view the latest technology available from leading manufacturers. Please contact Jodie Cartwright(contact details below) for further information. Exhibitors onsite will include:

 

AGAR logo
Technoorg Linda Logo
Zeiss Logo
Omicron NanoTechnology
EDAX
Hitachi High Technologies
JEOL
FEI
GATAN
Sem-Fib Solutions
Leica Microsystems
Objecting Imaging Ltd
Fischione Instruments
  




Key Dates

Abstract submission deadline14 December 2006
Notification of acceptance25 January 2007
Early registration deadline10 March 2007
Registration deadline23 March 2007 (6.00 pm)
Conference opens2 April 2007
Exhibition3 - 4 April 2007

 


Sponsorship

Conference organisers gratefully acknowledge support from:

JEOL
FEI

 


Enquiries

For further information on MSMXV please contact:

Jodie Cartwright
Institute of Physics
76 Portland Place
London
W1B 1NT

Tel: +44 (0)20 7470 4800
Fax: +44 (0)20 7470 4900
E-mail: jodie.cartwright@iop.org

Conference Co-Chairmen

Professor Tony Cullis
Department of Electronic and Electrical Engineering
University of Sheffield
Mappin Street
Sheffield
S1 3JD

Tel: +44 (0)114 222 5407
Fax: +44 (0)114 272 6391
E-mail: a.g.cullis@sheffield.ac.uk

Dr Paul Midgley
Department of Materials Science & Metallurgy
University of Cambridge
Pembroke Street
Cambridge
CB2 3QZ

Tel: +44 (0)1223 334 561
Fax: +44 (0)1223 334 437
E-mail: pam33@cam.ac.uk



^To the top^